Patents/Inventors

Takanobu Fujioka

TokyoJP1 patent

2 Patents

US125046882025
Negative Photosensitive Resin Composition and Method for Manufacturing Cured Relief Pattern
ASAHI KASEI KABUSHIKI KAISHA
0 cites
US123862592025
Negative-type Photosensitive Resin Composition and Method for Producing Polyimide and Cured Relief Pattern Using Same
ASAHI KASEI KABUSHIKI KAISHA
0 cites