Patents/Inventors

Takahiro Onoue

TokyoJP4 patents

4 Patents

US125911732026
Substrate with Multilayer Reflective Film, Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US121354962024
Reflective Mask Blank and Reflective Mask
HOYA CORPORATION
0 cites
US118801302024
Reflective Mask Blank, Reflective Mask and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US118529642023
Method for Manufacturing Reflective Mask Blank, Reflective Mask Blank, Method for Manufacturing Reflective Mask, Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites