Takahiro Nishihata

4 Patents

• US126200812026

  Semiconductor Pattern Overlay Error Determination Using Weighting Map Based on Optical Transmission Degree Through Overlying Layer

  Hitachi High-tech Corporation

  0 cites
• US122437112025

  Method, Apparatus, and Program for Determining Condition Related to Captured Image of Charged Particle Beam Apparatus

  HITACHI HIGH-TECH CORPORATION

  0 cites
• US121424572024

  Charged Particle Beam Device

  Hitachi High-tech Corporation

  0 cites
• US115453362023

  Scanning Electron Microscopy System and Pattern Depth Measurement Method

  HITACHI HIGH-TECH CORPORATION

  0 cites