Patents/Inventors

Taiga Fudetani

FukushimaJP1 patent

2 Patents

US123395802025
Reflective Mask Blank for EUV Lithography and Substrate Equipped with Conductive Film
AGC Inc.
0 cites
US120322802024
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Reflective Mask
AGC Inc.
0 cites