Patents/Inventors

Tadahiro Ishizaka

NirasakiJP7 patents

8 Patents

US124160752025
Film-forming Method and Film-forming System
Tokyo Electron Limited
0 cites
US124045822025
Method and Apparatus for Embedding Ruthenium in Recess Formed on Substrate Surface
TOKYO ELECTRON LIMITED
0 cites
US122278412025
Ruthenium Film Forming Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US120606352024
Hard Mask, Substrate Processing Method, and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US119938412024
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US119819922024
Method for Forming Rusi Film and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US117027342023
Method for Forming Ruthenium Film and Apparatus for Forming Ruthenium Film
Tokyo Electron Limited
0 cites
US116803202023
Ruthenium Film Forming Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites