53 Patents
- 0 cites
- US125786402026Photosensitive Material for Photoresist and Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
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TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US125357402026Interstitial Type Absorber for Extreme Ultraviolet Mask
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US124614472025Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124168532025EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124008642025Methods and Systems for Improving Plasma Ignition Stability
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123667972025EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US123531202025EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123460202025Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US123460232025Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123460272025Methods of Making a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123395792025Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US122653222025EUV Mask Blank and Method of Making EUV Mask Blank
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122596492025Cleaning Method for Photo Masks and Apparatus Therefor
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121817972024Extreme Ultraviolet Mask with Alloy Based Absorbers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US121693572024Method of Fabricating and Servicing a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121533372024Extreme Ultraviolet Mask with Tantalum Base Alloy Absorber
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US121533392024Network Type Pellicle Membrane and Method for Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US121533512024Enhancing Lithography Operation for Manufacturing Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121471542024EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121354992024Reticle Enclosure for Lithography Systems
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120929522024Methods for Forming Extreme Ultraviolet Mask Comprising Magnetic Material
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US120858432024Method of Manufacturing EUV Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120503992024Pellicle Assembly and Method of Making Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120449592024EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120449602024EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120193672024Mask Blanks and Methods for Depositing Layers on Mask Blank
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120136302024EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120011322024Protection Layer on Low Thermal Expansion Material (LTEM) Substrate of Extreme Ultraviolet (EUV) Mask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119602012024Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119142862024Pellicle Assembly and Method for Advanced Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - US119068972024Method for Extreme Ultraviolet Lithography Mask Treatment
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US118529652023Extreme Ultraviolet Mask with Tantalum Base Alloy Absorber
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US118529692023Cleaning Method for Photo Masks and Apparatus Therefor
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118290622023EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118290762023Enhancing Lithography Operation for Manufacturing Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118158042023EUV Mask Blank and Method of Making EUV Mask Blank0 cites
- US118158052023Mask for Extreme Ultraviolet Photolithography
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US117263992023EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117143502023Method of Fabricating and Servicing a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116504932023Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116198752023EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US115927372023EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US115502292023Enhancing Lithography Operation for Manufacturing Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites