30 Patents
- US125817212026Method for Gap Filling with Selectively Formed Seed Layer and Heteroepitaxial Cap Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124697422025Shallow Trench Isolation Forming Method and Structures Resulting Therefrom
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124246052025Hybrid Bonding with Uniform Pattern Density
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124263352025Reducing K Values of Dielectric Films Through Anneal
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124191002025Transistor Isolation Regions and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123896622025Formation Method of Shallow Trench Isolation
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123811952025Semiconductor Devices and Methods of Manufacture Thereof
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123693942025Semiconductor Device and Method of Forming Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123362492025Gate Spacer and Formation Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122030512025Acidic Cleaning and Disinfecting Composition Comprising Citric Acid, an Anionic/apg Surfactant Mixture, and Glycol Ether Solvent
THE CLOROX COMPANY
0 cites - US122060122025Reducing K Values of Dielectric Films Through Anneal
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121835732024Device and Method for High Pressure Anneal
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
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- US120682872024Stacked Semiconductor Structure and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120464792024Nitride-containing STI Liner for Sige Channel
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120092142024Gate Electrodes with Notches and Methods for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119963992024Hybrid Bonding with Uniform Pattern Density
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119964122024Semiconductor Device and Method of Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119786762024Semiconductor Structure and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119787582024Methods and Apparatus for via Last Through-vias
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119087512024Transistor Isolation Regions and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119012182024Shallow Trench Isolation Forming Method and Structures Resulting Therefrom
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118548002023Device and Method for High Pressure Anneal
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US117536032023Acidic Cleaning and Disinfecting Compositions Comprising a Citric/methansulfonic Acid Mixture
THE CLOROX COMPANY
0 cites - US116409862023Implantation and Annealing for Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116056352023Semiconductor Device and Method of Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116006532023Methods and Apparatus for via Last Through-vias
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US115879102023Stacked Semiconductor Structure and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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