13 Patents
- US125819252026Selective Metal Cap in an Interconnect Structure
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124329632025Device Having an Air Gap Adjacent to a Contact Plug and Covered by a Doped Dielectric Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123879742025Patterning Interconnects and Other Structures by Photo-sensitizing Method
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US121762512024Semiconductor Device with Profiled Work-function Metal Gate Electrode and Method of Making
Taiwan Semiconductor Manufacturing Company Limited
0 cites - 0 cites
- US120338902024Patterning Interconnects and Other Structures by Photo-sensitizing Method
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119014552024Method of Manufacturing a Finfet by Implanting a Dielectric with a Dopant
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US118241202023Method of Fabricating a Source/drain Recess in a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118044092023Semiconductor Device with Profiled Work-function Metal Gate Electrode and Method of Making
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
0 cites - US116768552023Patterning Interconnects and Other Structures by Photo-sensitizing Method
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites