3 Patents
- US124313402025Exhaust Gas Processing Apparatus Having Plasma Source and Substrate Processing Apparatus Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117382992023Exhaust Gas Processing System Including Adsorbent for Suppressing Powder-like Byproduct
Puresphere Co., Ltd.
0 cites - US115491782023Apparatus for Treating Semiconductor Process Gas and Method of Treating Semiconductor Process Gas
Puresphere Co., Ltd.
0 cites