6 Patents
- US123343082025Batch-type Apparatus for Atomic Layer Etching (ALE), and ALE Method and Semiconductor Device Manufacturing Method Based on the Same Apparatus
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US123241452025Semiconductor Device with Capping Conductive Layer on an Electrode and Method of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US117281602023Method of Forming Oxide Film Including Two Non-oxygen Elements, Method of Manufacturing Semiconductor Device, Method of Forming Dielectric Film, and Semiconductor Device
Samsung Electronics Co., Ltd.
0 cites - US116658842023Semiconductor Device with Capping Conductive Layer on an Electrode and Method of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites