5 Patents
- US125936282026Silicon Precursor Having a Heterocyclic Group, Composition for Depositing a Silicon-containing Layer Comprising the Same and Method of Depositing a Silicon-containing Layer Using the Same
Samsung Electronics Co., Ltd.
0 cites - US125460012026Composition for Depositing a Silicon-containing Layer and Method of Depositing a Silicon-containing Layer Using the Same
DNF Co., Ltd
0 cites - US123984592025Silicon Metal Oxide Encapsulation Film Comprising Metal or Metal Oxide in Thin Film, and Manufacturing Method Therefor
DNF CO., Ltd
0 cites - US123049242025Silylcyclodisilazane Compound and Method for Manufacturing Silicon-containing Thin Film Using the Same
DNF CO., Ltd.
0 cites