5 Patents
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- US122217182025Systems and Methods for Controlling a Gas Dopant Vaporization Rate During a Crystal Growth Process
Globalwafers Co., Ltd.
0 cites - US121958712025Systems and Methods for Controlling a Gas Dopant Vaporization Rate During a Crystal Growth Process
Globalwafers Co., Ltd.
0 cites - 0 cites
- US116680202023Systems and Methods for Production of Low Oxygen Content Silicon
Globalwafers Co., Ltd.
0 cites