6 Patents
- US124682262025Photoresist Compositions and Methods of Fabricating a Semiconductor Device
Samsung Electronics Co., Ltd.
0 cites - US124055322025Polymer and Composition for Forming an Anti-reflective Film and Method of Manufacturing an Integrated Circuit Device Using the Anti-reflective Film
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119829402024Photoacid Generator, Photoresist Composition Including the Same, and Method of Preparing the Photoacid Generator
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116933152023Photoacid Generator, Photoresist Composition Including the Same, and Method of Preparing the Photoacid Generator
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116626622023Photo-decomposable Compound, Photoresist Composition Including the Same, and Method of Manufacturing Integrated Circuit Device
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116505022023Polymer and Composition for Forming an Anti-reflective Film and Method of Manufacturing an Integrated Circuit Device Using the Anti-reflective Film
DONGJIN SEMICHEM CO., Ltd.
0 cites