8 Patents
- US124227542025Substrate Processing Apparatus, Semiconductor Manufacturing Equipment, and Substrate Processing Method
Samsung Electronics Co., Ltd.
0 cites - US122898802025Semiconductor Devices Having a Graphene Pattern Between the First Conductive Pattern and the Bit Line Capping
Samsung Electronics Co., Ltd.
0 cites - US121989232025Substrate Processing Method and Substrate Processing System
Samsung Electronics Co., Ltd.
0 cites - US121019232024Semiconductor Device Including Gate Structure Having First Portion and Second Portion and Method for Manufacturing the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120573232024Substrate Processing Method, Micropattern Forming Method, and Substrate Processing Apparatus
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US117007222023Method for Manufacturing a Semiconductor Device Using a Support Layer to Form a Gate Structure
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116401152023Substrate Processing Apparatus, Semiconductor Manufacturing Equipment, and Substrate Processing Method
Samsung Electronics Co., Ltd.
0 cites