Patents/Inventors

Srinivas D. Nemani

Saratoga, CAUS40 patents

41 Patents

US126107582026
Dielectric on Dielectric Selective Deposition Using Aniline Passivation
Regents Of The University Of California
0 cites
US124826522025
Method for Forming Integrated Circuit Structures
Applied Materials Inc.
0 cites
US124761052025
Directional Selective Fill for Silicon Gap Fill Processes
Applied Materials, Inc.
0 cites
US123476742025
Directional Selective Deposition
Applied Materials, Inc.
0 cites
US123157182025
Forming Films with Improved Film Quality
Applied Materials, Inc.
0 cites
US122886722025
Methods and Apparatus for Carbon Compound Film Deposition
APPLIED MATERIALS, Inc.
0 cites
US122887172025
Metal Based Hydrogen Barrier
Applied Materials, Inc.
0 cites
US122042462025
Metal Oxide Resist Patterning with Electrical Field Guided Post-exposure Bake
Applied Materials, Inc.
0 cites
US121989512025
High Pressure Wafer Processing Systems and Related Methods
Applied Materials, Inc.
0 cites
US121424672024
Self-assembled Monolayer Deposition from Low Vapor Pressure Organic Molecules
Applied Materials, Inc.
0 cites
US120858582024
Photoresist Patterning Process
Applied Materials, Inc.
0 cites
US120548272024
Flowable Film Curing Using H2 Plasma
Applied Materials, Inc.
0 cites
US120209822024
Metal Based Hydrogen Barrier
Applied Materials, Inc.
0 cites
US119938422024
Selective Deposition of Metal Oxide by Pulsed Chemical Vapor Deposition
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
0 cites
US119938452024
High Selectivity Atomic Layer Deposition Process
Applied Materials, Inc.
0 cites
US119729432024
Methods and Apparatus for Depositing Dielectric Material
APPLIED MATERIALS, Inc.
0 cites
US119553332024
Methods and Apparatus for Processing a Substrate
APPLIED MATERIALS, Inc.
0 cites
US119488282024
Pin-less Substrate Transfer Apparatus and Method for a Processing Chamber
Applied Materials, Inc.
0 cites
US119341032024
Apparatus for Post Exposure Bake of Photoresist
APPLIED MATERIALS, Inc.
0 cites
US119142992024
Lithography Process Window Enhancement for Photoresist Patterning
Applied Materials, Inc.
0 cites
US118993662024
Method and Apparatus for Post Exposure Processing of Photoresist Wafers
Applied Materials, Inc.
0 cites
US119012222024
Multi-step Process for Flowable Gap-fill Film
Applied Materials, Inc.
0 cites
US118801372024
Film Structure for Electric Field Guided Photoresist Patterning Process
Applied Materials, Inc.
0 cites
US118814112024
High Pressure Annealing Process for Metal Containing Materials
Applied Materials, Inc.
0 cites
US118624582024
Directional Selective Deposition
Applied Materials, Inc.
0 cites
US118158162023
Apparatus for Post Exposure Bake of Photoresist
Applied Materials, Inc.
0 cites
US117986062023
Additive Patterning of Semiconductor Film Stacks
APPLIED MATERIALS, Inc.
0 cites
US117568032023
Gas Delivery System for High Pressure Processing Chamber
Applied Materials, Inc.
0 cites
US117568282023
Cluster Processing System for Forming a Transition Metal Material
Applied Materials, Inc.
0 cites
US117495552023
Semiconductor Processing System
Applied Materials, Inc.
0 cites
US117252742023
Integrated Cluster Tool for Selective Area Deposition
Applied Materials, Inc.
0 cites
US116825562023
Methods of Improving Graphene Deposition for Processes Using Microwave Surface-wave Plasma on Dielectric Materials
APPLIED MATERIALS, Inc.
0 cites
US116642152023
High Selectivity Atomic Later Deposition Process
Applied Materials, Inc.
0 cites
US116505062023
Film Structure for Electric Field Guided Photoresist Patterning Process
Applied Materials Inc.
0 cites
US116315912023
Methods for Depositing Dielectric Material
APPLIED MATERIALS, Inc.
0 cites
US116262842023
Method of Forming a 2-dimensional Channel Material, Using Ion Implantation
Applied Materials, Inc.
0 cites
US116212262023
Graphene Diffusion Barrier
APPLIED MATERIALS, Inc.
0 cites
US116095052023
Apparatus and Methods for Verification and Re-use of Process Fluids
Applied Materials, Inc.
0 cites
US115811832023
Methods of Forming Amorphous Carbon Hard Mask Layers and Hard Mask Layers Formed Therefrom
Applied Materials, Inc.
0 cites
US115663252023
Silicon Carbonitride Gapfill with Tunable Carbon Content
Applied Materials, Inc.
0 cites
US115425972023
Selective Deposition of Metal Oxide by Pulsed Chemical Vapor Deposition
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
0 cites