12 Patents
- US125917282026Method Verifying Process Proximity Correction Using Machine Learning, and Semiconductor Manufacturing Method Using Same
Samsung Electronics Co., Ltd.
0 cites - US125922812026Semiconductor Devices and Electronic Systems Including the Same
Samsung Electronics Co., Ltd.
0 cites - US125609042026Machine Learning (ml)-based Process Proximity Correction (PPC) Method and Semiconductor Device Manufacturing Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US123267112025Method and Computing Device for Manufacturing Semiconductor Device
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120936302024Method and Computing Device for Manufacturing Semiconductor Device
Samsung Electronics Co., Ltd.
0 cites - US120865262024Methods and Devices of Correcting Layout for Semiconductor Processes Using Machine Learning
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119214192024Optical Proximity Correction Method and Method of Fabricating a Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119000432024Electronic Device for Manufacturing Semiconductor Device and Operating Method of Electronic Device
Samsung Electronics Co., Ltd.
0 cites - US118897002024Semiconductor Device Including Dummy Channels and Through Wiring Structure
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117630582023Method and Computing Device for Manufacturing Semiconductor Device
Samsung Electronics Co., Ltd.
0 cites - 0 cites