Patents/Inventors

Soonam Park

Suwon-siKR17 patents

15 Patents

US125735902026
Plasma Processing Apparatus and Method of Manufacturing Semiconductor Device by Using Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US125487422026
Corrosion Resistant Ground Shield of Processing Chamber
Applied Materials, Inc.
0 cites
US124445892025
Operation Method of Etching Apparatus and Method of Manufacturing Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US123409792025
Semiconductor Processing Chamber for Improved Precursor Flow
Applied Materials, Inc.
0 cites
US122886752025
Cylindrical Cavity with Impedance Shifting by Irises in a Power-supplying Waveguide
Applied Materials, Inc.
0 cites
US121462192024
Flow Control Features of CVD Chambers
Applied Materials, Inc.
0 cites
US120092282024
Low Temperature Chuck for Plasma Processing Systems
Applied Materials, Inc.
0 cites
US119729302024
Cylindrical Cavity with Impedance Shifting by Irises in a Power-supplying Waveguide
Applied Materials, Inc.
0 cites
US119159502024
Multi-zone Semiconductor Substrate Supports
Applied Materials, Inc.
0 cites
US118347442023
Ceramic Showerheads with Conductive Electrodes
Applied Materials, Inc.
0 cites
US117354412023
Systems and Methods for Improved Semiconductor Etching and Component Protection
Applied Materials, Inc.
0 cites
US117281392023
Process Chamber for Cyclic and Selective Material Removal and Etching
Applied Materials, Inc.
0 cites
US115916932023
Ceramic Showerheads with Conductive Electrodes
Applied Materials, Inc.
0 cites
US115944282023
Low Temperature Chuck for Plasma Processing Systems
Applied Materials, Inc.
0 cites
US115628902023
Corrosion Resistant Ground Shield of Processing Chamber
Applied Materials, Inc.
0 cites