Patents/Inventors

Soo Yeon Sim

Suwon-siKR2 patents

2 Patents

US125402562026
CMP Slurry Composition for Polishing Copper and Copper Film Polishing Method Using the Same
SAMSUNG SDI CO., Ltd.
0 cites
US120776812024
CMP Slurry Composition for Polishing Tungsten Pattern Wafer and Method of Polishing Tungsten Pattern Wafer Using the Same
SAMSUNG SDI CO., Ltd.
0 cites