Sonia Castellanos Ortega

4 Patents

• US124986412025

  Process Environment for Inorganic Resist Patterning

  Tokyo Electron Limited

  0 cites
• US123994282025

  Method and Apparatus for Forming a Patterned Layer of Material

  ASML NETHERLANDS B.V.

  0 cites
• US119472622024

  Process Environment for Inorganic Resist Patterning

  Inpria Corporation

  0 cites
• US118079372023

  Method and Apparatus for Forming a Patterned Layer of Carbon, Method of Forming a Patterned Layer of Material

  ASML Netherlands B.V.

  0 cites