15 Patents
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- US124513802025Semiconductor Fabrication Using Process Control Parameter Matrix
Applied Materials, Inc.
0 cites - US124203732025Control of Processing Parameters During Substrate Polishing Using Cost Function
Applied Materials, Inc.
0 cites - 0 cites
- US122720472025Residue Measurement from Machine Learning Based Processing of Substrate Images
Applied Materials, Inc.
0 cites - US121699252024System Using Film Thickness Estimation from Machine Learning Based Processing of Substrate Images
Applied Materials, Inc.
0 cites - 0 cites
- US119698542024Control of Processing Parameters During Substrate Polishing Using Expected Future Parameter Changes
Applied Materials, Inc.
0 cites - 0 cites
- US119191212024Control of Processing Parameters During Substrate Polishing Using Constrained Cost Function
Applied Materials, Inc.
0 cites - US118477762023System Using Film Thickness Estimation from Machine Learning Based Processing of Substrate Images
Applied Materials, Inc.
0 cites - US118369132023Film Thickness Estimation from Machine Learning Based Processing of Substrate Images
Applied Materials, Inc.
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