Silvio Preti

5 Patents

• US124354202025

  Reaction Chamber for an Epitaxial Reactor of Semiconductor Material with Non-uniform Longitudinal Section and Reactor

  LPE S.P.A.

  0 cites
• US123314232025

  Reaction Chamber for a Deposition Reactor with Interspace and Lower Closing Element and Reactor

  DENSO CORPORATION

  0 cites
• US123259322025

  Method for CVD Deposition of N-type Doped Silicon Carbide and Epitaxial Reactor

  LPE S.p.a.

  0 cites
• US121958772025

  Substrate Support Device for a Reaction Chamber of an Epitaxial Reactor with Gas Flow Rotation, Reaction Chamber and Epitaxial Reactor

  LPE S.P.A.

  0 cites
• US118347532023

  Reactor for Epitaxial Deposition with a Heating Inductor with Movable Turns

  LPE S.p.a.

  0 cites