12 Patents
- US123849592025Tungsten Oxide Material, Tungsten Oxide Powder Mass for Electrochromic Device, and Slurry for Producing Electrochromic Device
Toshiba Materials Co., Ltd.
0 cites - US123225762025Member for Use in Plasma Processing Device, and Plasma Processing Device Provided Therewith
KYOCERA Corporation
0 cites - US122834662025Member for Use in Plasma Processing Device, and Plasma Processing Device Provided Therewith
KYOCERA Corporation
0 cites - US122031612025Component for Plasma Processing Apparatus and Plasma Processing Apparatus Including Component
Kyocera Corporation
0 cites - US120657272024Member for Plasma Processing Device and Plasma Processing Device Provided with Same
Kyocera Corporation
0 cites - US119487792024Component for Plasma Processing Apparatus and Plasma Processing Apparatus
KYOCERA Corporation
0 cites - 0 cites
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- US115722752023Aluminum Nitride Film, Method of Manufacturing Aluminum Nitride Film, and High Withstand Voltage Component
TOSHIBA MATERIALS CO., Ltd.
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