Shuhei Onishi

2 Patents

• US124127612025

  Method of Controlling the Patterned Wafer Process Temperature Using the Contact Type Thermometer in the Front Side of a Dummy Substrate to Accurately Measure Emissivity in Order to Perform Temperature Measurement Using Radiation Thermometer

  SCREEN Holdings Co., Ltd.

  0 cites
• US117619112023

  Phantom for Evaluating CT Device

  Shimadzu Corporation

  0 cites