Patents/Inventors

Sho Kumakura

MiyagiJP16 patents

14 Patents

US125326832026
Apparatus for Substrate Processing
TOKYO ELECTRON LIMITED
0 cites
US124513612025
Plasma Processing Method, Plasma Processing Apparatus, and Plasma Processing System
TOKYO ELECTRON LIMITED
0 cites
US124313352025
Substrate Processing Method and Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US123548372025
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US123082412025
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US121257102024
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US121129542024
Etching Method, Substrate Processing Apparatus, and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US121005782024
Substrate Processing Method
TOKYO ELECTRON LIMITED
0 cites
US120716872024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US119617462024
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118624412024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117281662023
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116370252023
Apparatus for Selectively Etching First Region Made of Silicon Nitride Against Second Region Made of Silicon Oxide
TOKYO ELECTRON LIMITED
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US115748062023
Film Forming Method
TOKYO ELECTRON LIMITED
0 cites