7 Patents
- US124297762025Lithography Method with Reduced Impacts of Mask Defects
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124061302025Geometric Mask Rule Check with Favorable and Unfavorable Zones
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122355892025Method of Manufacturing a Semiconductor Device and Apparatus for Manufacturing the Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120199742024Geometric Mask Rule Check with Favorable and Unfavorable Zones
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117149512023Geometric Mask Rule Check with Favorable and Unfavorable Zones
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117094352023Method of Manufacturing a Semiconductor Device and Apparatus for Manufacturing the Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116759622023Vertex-based OPC for Opening Patterning
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites