6 Patents
- US125884772026Method of Etching a Semiconductor Device by Etching Initial Mask Structures at a Region Having an Extension Direction Different from the Extension Direction of the Initial Mask Structures
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US125385462026Semiconductor Structure and Forming Method Thereof
Semiconductor Manufacturing International (Shanghai) Corporation
0 cites - US123896732025Semiconductor Structure and Method of Forming Semiconductor Structure
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US118814802024Semiconductor Structure and Method of Forming Semiconductor Structure
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US117567952023Semiconductor Structure and Fabrication Method Thereof
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US115519242023Semiconductor Structure and Method for Forming the Same
Semiconductor Manufacturing International (Beijing) Corporation
0 cites