Patents/Inventors

Sheng-lin Hsieh

HsinchuTW1 patent

2 Patents

US124630352025
Trench Etching Process for Photoresist Line Roughness Improvement
TSMC NANJING COMPANY, LIMITED
0 cites
US120209332024
Trench Etching Process for Photoresist Line Roughness Improvement
TSMC NANJING COMPANY, LIMITED
0 cites