Patents/Inventors

Shane Lavan

Santa Clara, CAUS12 patents

13 Patents

USD10727742025
Target Profile for a Physical Vapor Deposition Chamber Target
APPLIED MATERIALS, Inc.
0 cites
US121835602024
Gas Injection Process Kit to Eliminate Arcing and Improve Uniform Gas Distribution for a PVD Process
APPLIED MATERIALS, Inc.
0 cites
US121856432024
High Critical Temperature Metal Nitride Layer with Oxide or Oxynitride Seed Layer
Applied Materials, Inc.
0 cites
US121762052024
Method and Chamber for Backside Physical Vapor Deposition
Applied Materials, Inc.
0 cites
US121424782024
Method and Chamber for Backside Physical Vapor Deposition
Applied Materials, Inc.
0 cites
US120967012024
Method of Making High Critical Temperature Metal Nitride Layer
Applied Materials, Inc.
0 cites
US120529352024
Method of Making High Critical Temperature Metal Nitride Layer
Applied Materials, Inc.
0 cites
US120273542024
Cleaning of SIN with CCP Plasma or RPS Clean
Applied Materials, Inc.
0 cites
US119159182024
Cleaning of Sin with CCP Plasma or RPS Clean
APPLIED MATERIALS, Inc.
0 cites
US116785892023
Method of Making High Critical Temperature Metal Nitride Layer
Applied Materials, Inc.
0 cites
US116004772023
Gas Injection Process Kit to Eliminate Arcing and Improve Uniform Gas Distribution for a PVD Process
APPLIED MATERIALS, Inc.
0 cites
US116007612023
High Critical Temperature Metal Nitride Layer with Oxide or Oxynitride Seed Layer
Applied Materials, Inc.
0 cites
US115726182023
Method and Chamber for Backside Physical Vapor Deposition
APPLIED MATERIALS, Inc.
0 cites