Shan-hui Lin

4 Patents

• US124871852025

  Systems and Methods for Processing Semiconductor Wafers Using Front-end Processed Wafer Edge Geometry Metrics

  Globalwafers Co., Ltd.

  0 cites
• US123858502025

  Semiconductor Wafers Using Front-end Processed Wafer Global Geometry Metrics

  Globalwafers Co., Ltd.

  0 cites
• US122278742025

  Methods for Determining Suitability of Czochralski Growth Conditions for Producing Substrates for Epitaxy

  Globalwafers Co., Ltd.

  0 cites
• US121523142024

  Methods for Determining Suitability of Silicon Substrates for Epitaxy

  Globalwafers Co., Ltd.

  0 cites