7 Patents
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- US123004732025Electrostatic Chuck for High Bias Radio Frequency (RF) Power Application in a Plasma Processing Chamber
APPLIED MATERIALS, Inc.
0 cites - US122371492025Reducing Aspect Ratio Dependent Etch with Direct Current Bias Pulsing
Applied Materials, Inc.
0 cites - US120805192024Smart Dynamic Load Simulator for RF Power Delivery Control System
Applied Materials, Inc.
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