67 Patents
- US126033422026Battery Module Including Bus Bar Assembly Slidely Disposed on Electrode Tabs of Battery Cells and Manufacturing Method Thereof
SK On Co., Ltd.
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- US125299252026Anti-glare Film, Polarizing Plate and Display Apparatus
Xinmei Fontana Holding (Hong Kong) Limited
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- US123983422025Process Liquid Composition for Lithography and Pattern Forming Method Using Same
YOUNG CHANG CHEMICAL CO., Ltd
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- US123050802025Slurry Composition for Polishing Silicon Oxide Film, and Polishing Method Using Same
YOUNG CHANG CHEMICAL CO., Ltd
0 cites - US123060842025Method for Analyzing Silicon Concentration in Phosphoric Acid Solution
SEMIBOOSTER CO., Ltd.
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- US122782712025Semiconductor Device Having Capping Layers with Different Germanium Concentrations Over an Active Pattern
SAMSUNG ELECTRONICS CO., Ltd.
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- US122565642025Semiconductor Device Having a Liner Layer and Method of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US122438742025Method of Forming a Static Random-access Memory (SRAM) Cell with Fin Field Effect Transistors
Samsung Electronics Co., Ltd.
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- US121660812024Semiconductor Device-including Source and Drain Regions and Superlattice Pattern Having a Pillar Shape
Samsung Electronics Co., Ltd.
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- US121054212024Highly Thick Spin-on-carbon Hard Mask Composition and Patterning Method Using Same
YOUNG CHANG CHEMICAL CO., Ltd
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- US120947192024Etching Pattern Forming Method in Semiconductor Manufacturing Process
YOUNG CHANG CHEMICAL CO., Ltd
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- US120504032024Organic-inorganic Hybrid Photoresist Processing Liquid Composition
YOUNG CHANG CHEMICAL CO., Ltd
0 cites - US120466322024Semiconductor Device Having Air Gap Between Gate Electrode and Source/drain Pattern
Samsung Electronics Co., Ltd.
0 cites - US120275962024Semiconductor Device with Source/drain Pattern Including Buffer Layer
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119706722024Cleaning Liquid Composition for Semiconductor Wafer and Cleaning Method Using Same
YOUNG CHANG CHEMICAL CO., Ltd
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- US119359432024Semiconductor Devices and Methods of Manufacturing the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119069002024Chemically Amplified Positive Photoresist Composition for Improving Pattern Profile
YOUNG CHANG CHEMICAL CO., Ltd
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- US119015302024Battery Module Including Bus Bar Assembly Sidely Disposed on Electrode Tabs of Battery Cells and Manufacturing Method Thereof
SK ON CO., Ltd.
0 cites - US118880282024Semiconductor Device Having a Liner Layer and Method of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US118626792024Semiconductor Device Having Increased Contact Area Between a Source/drain Pattern and an Active Contact
SAMSUNG ELECTRONICS CO., Ltd.
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- US116996132023Semiconductor Devices and Methods of Fabricating the Same
Samsung Electronics Co., Ltd.
0 cites - US116887782023Semiconductor Device Including Three-dimensional Field-effect Transistor with Curved Multi-layered Source/drain Pattern
SAMSUNG ELECTRONICS CO., Ltd.
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- US116827352023Semiconductor Device Including Nanowires Having Multi-thickness Regions
SAMSUNG ELECTRONICS CO., Ltd.
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- US116249842023Process Liquid Composition for Extreme Ultraviolet Lithography and Pattern Forming Method Using Same
YOUNG CHANG CHEMICAL CO., Ltd
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- US116057112023Semiconductor Device Having an Air Gap Between Gate Electrode and Source/drain Pattern
SAMSUNG ELECTRONICS CO., Ltd.
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- US115861092023Chemically-amplified-type Negative-type Photoresist Composition
YOUNG CHANG CHEMICAL CO., Ltd
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