4 Patents
- US120992932024Phase Shift Mask for Extreme Ultraviolet Lithography and a Method of Manufacturing a Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - US118525832023Apparatus and Method for Measuring Phase of Extreme Ultraviolet (EUV) Mask and Method of Fabricating EUV Mask Including the Method
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US116353712023Apparatus and Method for Measuring Phase of Extreme Ultraviolet (EUV) Mask and Method of Fabricating EUV Mask Including the Method
Samsung Electronics Co., Ltd.
0 cites