11 Patents
- US126079442026Extreme Ultraviolet Source Cleaning Apparatus, EUV Source Cleaning Method Using the Same, and Substrate Processing Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US125687902026Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US123728852025Substrate Processing Apparatus and Method of Fabricating Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US119278902024Substrate Processing Apparatus and Method of Fabricating Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119232092024Substrate Processing Apparatus and Substrate Processing Method
Samsung Electronics Co., Ltd.
0 cites - US117336162023System for Supplying Photoresist and Method for Fabricating Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117264062023Method of Coating a Photoresist and Apparatus for Performing the Same
Seoul National University R&DB Foundation
0 cites - US115904602023Chemical Solution Evaporation Device and Substrate Processing Device Including the Same
Samsung Electronics Co., Ltd.
0 cites