Seiji Tono

4 Patents

• US126125802026

  Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite Ions

  Tokuyama Corporation

  0 cites
• US124669992025

  Silicon Etching Liquid, and Method for Producing Silicon Device and Method for Processing Silicon Substrate, Each Using Said Etching Liquid

  TOKUYAMA CORPORATION

  0 cites
• US122699802025

  Silicon Etching Solution and Method for Producing Silicon Device Using the Etching Solution

  SCREEN Holdings Co., Ltd.

  0 cites
• US115725332023

  Quaternary Alkylammonium Hypochlorite Solution, Method for Manufacturing Same, and Method for Cleaning Semiconductor Wafer

  Tokuyama Corporation

  0 cites