Seiichiro Tachibana

11 Patents

• US125884742026

  Composition for Forming Protective Film Against Alkaline Aqueous Hydrogen Peroxide, Substrate for Producing Semiconductor Apparatus, Method for Forming Protective Film, and Method for Forming Pattern

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US123796622025

  Material for Forming Organic Film, Patterning Process, Compound, and Polymer

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US123796632025

  Material for Forming Organic Film, Patterning Process, and Polymer

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US120322872024

  Resist Material and Patterning Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US119947982024

  Resist Material and Patterning Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US118861182024

  Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US118515302023

  Material for Forming Organic Film, Patterning Process, and Polymer

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US116920662023

  Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Compound for Forming Organic Film

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US116768142023

  Material for Forming Organic Film, Substrate for Manufacturing Semiconductor Apparatus, Method for Forming Organic Film, and Patterning Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US116356912023

  Composition for Forming Organic Film, Substrate for Manufacturing Semiconductor Device, Method for Forming Organic Film, Patterning Process, and Polymer

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US116146862023

  Resist Composition and Patterning Process

  Shin-etsu Chemical Co., Ltd.

  0 cites