Patents/Inventors

Satoru Kawakami

Tokyo-toJP19 patents

21 Patents

US126092852026
Semiconductor Manufacturing Apparatus and Manufacturing Method for Semiconductor Device
TOKYO ELECTRON LIMITED
0 cites
US125340882026
Distraction Judgment Device, Distraction Judgment Method, and Nontransitory Computer Storage Medium
DENSO CORPORATION
0 cites
US124826352025
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US124826372025
Plasma Source and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US124663162025
Notification Control Device and Notification Control Method
DENSO CORPORATION
0 cites
US124566092025
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124513262025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US124127322025
Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US123621432025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US123621512025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US123512042025
Monitoring System, Storage Medium Storing Computer Program for Monitoring and Method for Monitoring
TOYOTA JIDOSHA KABUSHIKI KAISHA
0 cites
US122834652025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US122610252025
Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US122179412025
Plasma Processing Apparatus, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US121839292024
Energy Storage Device and Method for Manufacturing the Same
GS YUASA INTERNATIONAL Ltd.
0 cites
US121486372024
Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US120515642024
Shower Plate, Plasma Processing Apparatus and Plasma Processing Method
TOHOKU UNIVERSITY
0 cites
US120464552024
Shower Plate, Lower Dielectric Member and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US120209002024
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US119292342024
Plasma Processing Apparatus and Lower Stage
TOHOKU UNIVERSITY
0 cites
US119231702024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites