11 Patents
- US125605322026Apparatus for Measuring Radical Density Distribution Based on Light Absorption and Operating Method Thereof
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US124313412025Apparatus for Arcing Diagnosis, Plasma Process Equipment Including the Same, and Arcing Diagnosis Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US121835552024Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US121256872024System of Semiconductor Process and Control Method Thereof
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120875502024Device for Measuring Density of Plasma, Plasma Processing System, and Semiconductor Device Manufacturing Method Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119962752024Device for Radical Diagnostic in Plasma Processing Chamber, Radical Diagnostic System Having the Same, and Operating Method Thereof
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US118697512024Upper Electrode and Substrate Processing Apparatus Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117053062023Variable Frequency and Non-sinusoidal Power Generator Using Double Side Cooling, Plasma Processing Apparatus Including the Same and Method of Manufacturing Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - US115453442023Upper Electrode and Substrate Processing Apparatus Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites