12 Patents
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- US125060102025Wet Etching Method and Method of Fabricating Semiconductor Device by Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US124396022025Semiconductor Device Including Data Storage Pattern with Improved Retention Characteristics
SAMSUNG ELECTRONICS CO., Ltd.
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- US116659002023Vertical Memory Devices Including Charge Trapping Patterns with Improved Retention Characteristics
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116534932023Semiconductor Memory Device and Method of Manufacturing the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US115520982023Semiconductor Device Including Data Storage Pattern with Improved Retention Characteristics
SAMSUNG ELECTRONICS CO., Ltd.
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