24 Patents
- US126222042026Plasma Etching Chemistries of High Aspect Ratio Features in Dielectrics
Lam Research Corporation
0 cites - US125867652026Surface Modification for Metal-containing Photoresist Deposition
Lam Research Corporation
0 cites - US125506602026Plasma Etching Chemistries of High Aspect Ratio Features in Dielectrics
Lam Research Corporation
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- US124008422025Method of Cleaning Chamber Components with Metal Etch Residues
Lam Research Corporation
0 cites - US123410212025Selective Etch Using Deposition of a Metalloid or Metal Containing Hardmask
Lam Research Corporation
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- US122495142025Carbon Based Depositions Used for Critical Dimension Control During High Aspect Ratio Feature Etches and for Forming Protective Layers
Lam Research Corporation
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- US121911252025Removing Metal Contamination from Surfaces of a Processing Chamber
Lam Research Corporation
0 cites - US121192432024Plasma Etching Chemistries of High Aspect Ratio Features in Dielectrics
Lam Research Corporation
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- US118428882023Removing Metal Contamination from Surfaces of a Processing Chamber
Lam Research Corporation
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- US115944292023Plasma Etching Chemistries of High Aspect Ratio Features in Dielectrics
Lam Research Corporation
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