Patents/Inventors

Ryuichi Asako

MiyagiJP7 patents

7 Patents

US125326832026
Apparatus for Substrate Processing
TOKYO ELECTRON LIMITED
0 cites
US124446062025
Methods for Forming Vertically Layered Ionic Liquid Crystal (ILC) Structures on a Semiconductor Substrate
Tokyo Electron Limited
0 cites
US124179282025
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US124068622025
Vacuum Processing Apparatus and Oxidizing Gas Removal Method
Tokyo Electron Limited
0 cites
US123796532025
Pattern Formation Method and Photosensitive Hard Mask
TOKYO ELECTRON LIMITED
0 cites
US120117382024
Substrate Processing Method and Ionic Liquid
TOKYO ELECTRON LIMITED
0 cites
US118429002023
Etching Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites