Patents/Inventors

Ryota Ueno

ToyamaJP1 patent

2 Patents

US123810912025
Method of Processing Substrate, Method of Manufacturing Semiconductor Device, Recording Medium, and Substrate Processing Apparatus
Kokusai Electric Corporation
0 cites
US116995932023
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, and Recording Medium
KOKUSAI ELECTRIC CORPORATION
0 cites