2 Patents
- US123325652025Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US119142952024Thermosetting Iodine- and Silicon-containing Material, Composition Containing the Material for Forming Resist Underlayer Film for EUV Lithography, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites