47 Patents
- US126106112026Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US125385622026Method of Manufacturing a Semiconductor Device Including Depositing and Etching a Liner Multiple Times
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125325292026Semiconductor Devices and Methods of Manufacturing Thereof
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125324992026Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US124904962025Metal Gate Structure and Methods of Fabricating Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124713582025Semiconductor Structure and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US124713102025Method of Making a Finfet Device Including a Step of Removing a Portion of a Fin
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US124084122025Air Spacers Around Contact Plugs and Method Forming Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123639942025Residue-free Metal Gate Cutting for Fin-like Field Effect Transistor
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123100962025Method for Fabricating Semiconductor Structure with Cutting Depth Control
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123025962025Fin Field-effect Transistor and Method of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122940042025Fin Field-effect Transistor and Method of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122726892025Semiconductor Structure with Composite Oxide Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US121703322024Fin Field Effect Transistor Devices Including NMOS Device and PMOS Device with Varied Geometry of Work Function Layers
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US121320502024Semiconductor Structure Cutting Process and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121129902024Semiconductor Device with Cut Metal Gate and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120876392024Fin Field-effect Transistor Devices and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120681992024Methods for Forming Fin Field-effect Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120276082024Semiconductor Structure Having Dielectric Structure Extending Into Second Cavity of Semiconductor Fin
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120209862024Semiconductor Structure and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US120210792024Fin Field-effect Transistor and Method of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120150302024Gate Stacks for Semiconductor Devices of Different Conductivity Types
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120150712024Air Spacers Around Contact Plugs and Method Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120027662024Semiconductor Structure Having Isolations Between Fins and Comprising Materials with Different Thermal Expansion Coefficients (CTE)
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US119964662024Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US119619192024Nanostructure Field-effect Transistor Device and Method of Forming
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119425322024Fin Field-effect Transistor and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119233592024Method for Forming Fin Field Effect Transistor (finfet) Device Structure
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119159802024Residue-free Metal Gate Cutting for Fin-like Field Effect Transistor
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118943702024Semiconductor Structure Cutting Process and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118944432024Method of Making Gate Structure of a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118482402023Method of Manufacturing a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US118045482023Semiconductor Structure and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - US117215882023Semiconductor Structure with Cutting Depth Control and Method for Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116705522023Methods for Forming Fin Field-effect Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116520052023Semiconductor Device with Cut Metal Gate and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116372062023Metal Gate Structure and Methods of Fabricating Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
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