9 Patents
- US123931272025Exposure Light Beam Phase Measurement Method in Laser Interference Photolithography, and Photolithography System
Beijing U-precision Tech Co., Ltd.
0 cites - US123460302025Device and Method for Regulating and Controlling Incident Angle of Light Beam in Laser Interference Lithography
BEIJING U-PRECISION TECH CO., Ltd.
0 cites - US123320532025Heterodyne Grating Interferometry System Based on Secondary Diffraction
Beijing U-precision Tech Co., Ltd.
0 cites - US122706452025High-resolution Phase Detection Method and System Based on Plane Grating Laser Interferometer
TSINGHUA UNIVERSITY
0 cites - US121893002025Scanning Interference Lithographic System
Tsinghua University; Beijing U-precision Tech Co., Ltd.
0 cites - US121693672024Vertical Motion Protection Method and Device Based on Dual-stage Motion System of Photolithography Machine
TSINGHUA UNIVERSITY
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