Robert Jay Rafac

5 Patents

• US123692442025

  Laser System for Source Material Conditioning in an EUV Light Source

  ASML Netherlands B.V.

  0 cites
• US122388482025

  EUV Light Source Target Metrology

  ASML Netherlands B.V.

  0 cites
• US121710532024

  System for Monitoring a Plasma

  ASML Netherlands B.V.

  0 cites
• US120789342024

  Laser System for Target Metrology and Alteration in an EUV Light Source

  ASML Netherlands B.V.

  0 cites
• US117586392023

  Determining Moving Properties of a Target in an Extreme Ultraviolet Light Source

  ASML Netherlands B.V.

  0 cites