Ravindra Kanjolia

5 Patents

• US125903742026

  Selective Thermal Atomic Layer Etching

  Versum Materials US, LLC

  0 cites
• US124976942025

  Method of Forming Low-resistivity Ru ALD Through a Bi-layer Process and Related Structures

  Samsung Electronics Co., Ltd.

  0 cites
• US122975372025

  Compounds and Methods for Selectively Forming Metal-containing Films

  MERCK PATENT GmbH

  0 cites
• US121805832024

  Methods of Forming Low Resistivity Titanium Nitride Thin Film in Horizontal Vias and Related Devices

  Merck Patent GmbH

  0 cites
• US119763522024

  Methods of Vapor Deposition of Ruthenium Using an Oxygen-free Co-reactant

  MERCK PATENT GmbH

  0 cites