Patents/Inventors

Rami Hourani

Santa Clara, CAUS32 patents

29 Patents

US125107072025
Total or Local Thickness Variation for Optical Devices
Applied Materials, Inc.
0 cites
US124128382025
Integrated Circuit Structure with Filled Recesses
0 cites
US123841852025
Methods, Systems, and Apparatus for Inkjet Printing Self-assembled Monoloayer (SAM) Structures on Substrates
APPLIED MATERIALS, Inc.
0 cites
US123727922025
High Index Edge Blackening Material
APPLIED MATERIALS, Inc.
0 cites
US123530092025
Total or Local Thickness Variation for Optical Devices
Applied Materials, Inc.
0 cites
US123410612025
Bottom-up Fill Dielectric Materials for Semiconductor Structure Fabrication and Their Methods of Fabrication
Intel Corporation
0 cites
US122494892025
Optical Device Improvement
Applied Materials, Inc.
0 cites
US122421862025
Methods for Increasing the Density of High-index Nanoimprint Lithography Films
APPLIED MATERIALS, Inc.
0 cites
US122086372025
Patterning of Optical Device Films via Inkjet Soluble Mask, Deposition, and Lift-off
Applied Materials, Inc.
0 cites
US121219252024
Edge Blackening for Optical Devices
APPLIED MATERIALS, Inc.
0 cites
US121096412024
Optical Device Having Structural and Refractive Index Gradation, and Method of Fabricating the Same
APPLIED MATERIALS, Inc.
0 cites
US121105822024
Interfacial Layer for Optical Film Performance
APPLIED MATERIALS, Inc.
0 cites
US120878362024
Contact Over Active Gate Structures with Metal Oxide-caped Contacts to Inhibit Shorting
Intel Corporation
0 cites
US120778602024
Doped Amorphous Optical Device Films and Deposition via Incorporation of Dopant Atoms
Applied Materials, Inc.
0 cites
US120806392024
Contact Over Active Gate Structures with Metal Oxide Layers to Inhibit Shorting
Intel Corporation
0 cites
US120449632024
High Refractive Index Imprint Compositions and Materials and Processes for Making the Same
APPLIED MATERIALS, Inc.
0 cites
US120365782024
Interconnect Structure Surface Modifications by Passivating Agents
Intel Corporation
0 cites
US119904032024
Dielectric Helmet-based Approaches for Back End of Line (BEOL) Interconnect Fabrication and Structures Resulting Therefrom
Intel Corporation
0 cites
US119760022024
Methods for Encapsulating Silver Mirrors on Optical Structures
APPLIED MATERIALS, Inc.
0 cites
US119763512024
Titanium Oxide Optical Device Films Deposited by Physical Vapor Deposition
Applied Materials, Inc.
0 cites
US119538262024
Lined Photobucket Structure for Back End of Line (BEOL) Interconnect Formation
Intel Corporation
0 cites
US119553772024
Differential Hardmasks for Modulation of Electrobucket Sensitivity
Intel Corporation
0 cites
US118927712024
Methods for Increasing the Density of High-index Nanoimprint Lithography Films
APPLIED MATERIALS, Inc.
0 cites
US118942702024
Grating Replication Using Helmets and Topographically-selective Deposition
Intel Corporation
0 cites
US118680432024
Imprint Compositions with Passivated Nanoparticles and Materials and Processes for Making the Same
APPLIED MATERIALS, Inc.
0 cites
US118698892024
Self-aligned Gate Endcap (SAGE) Architectures Without Fin End Gap
Intel Corporation
0 cites
US118506212023
Edge Blackening for Optical Devices
Applied Materials, Inc.
0 cites
US118376442023
Contact Over Active Gate Structures with Metal Oxide-caped Contacts to Inhibit Shorting
Intel Corporation
0 cites
US116160602023
Techniques for Forming Gate Structures for Transistors Arranged in a Stacked Configuration on a Single Fin Structure
Intel Corporation
0 cites