Patents/Inventors

Rajinder Dhindsa

Pleasanton, CAUS32 patents

28 Patents

US126205462026
Creating Ion Energy Distribution Functions (IEDF)
APPLIED MATERIALS, Inc.
0 cites
US125801622026
Temperature and Bias Control of Edge Ring
Applied Materials, Inc.
0 cites
US124696872025
Plasma Processing Chambers Configured for Tunable Substrate and Edge Sheath Control
Applied Materials, Inc.
0 cites
US124566112025
Systems and Methods for Controlling a Voltage Waveform at a Substrate During Plasma Processing
APPLIED MATERIALS, Inc.
0 cites
US124359632025
Apparatus and Method for Controlling Edge Ring Variation
Applied Materials, Inc.
0 cites
US123973302025
Condition Selectable Backside Gas
Applied Materials, Inc.
0 cites
US123548472025
Methods and Apparatus for Conductance Liners in Semiconductor Process Chambers
APPLIED MATERIALS, Inc.
0 cites
US122550552025
Integrated Cleaning Process for Substrate Etching
Applied Materials, Inc.
0 cites
US122550512025
Multi-shape Voltage Pulse Trains for Uniformity and Etch Profile Tuning
Applied Materials, Inc.
0 cites
US122371482025
Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US122117342025
Lift Pin Mechanism
APPLIED MATERIALS, Inc.
0 cites
US121424692024
Plasma Processing Chambers Configured for Tunable Substrate and Edge Sheath Control
Applied Materials, Inc.
0 cites
US120947522024
Wafer Edge Ring Lifting Solution
Applied Materials, Inc.
0 cites
US120572922024
Feedback Loop for Controlling a Pulsed Voltage Waveform
Applied Materials, Inc.
0 cites
US120092362024
Sensors and System for In-situ Edge Ring Erosion Monitor
Applied Materials, Inc.
0 cites
US119843062024
Plasma Chamber and Chamber Component Cleaning Methods
Applied Materials, Inc.
0 cites
US118481762023
Plasma Processing Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US118173122023
Delayed Pulsing for Plasma Processing of Wafers
APPLIED MATERIALS, Inc.
0 cites
US118107682023
Temperature and Bias Control of Edge Ring
Applied Materials, Inc.
0 cites
US117911402023
Confinement Ring for Use in a Plasma Processing System
Lam Research Corporation
0 cites
US117767892023
Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US117281242023
Creating Ion Energy Distribution Functions (IEDF)
APPLIED MATERIALS, Inc.
0 cites
US116995722023
Feedback Loop for Controlling a Pulsed Voltage Waveform
Applied Materials, Inc.
0 cites
US116685532023
Apparatus and Method for Controlling Edge Ring Variation
Applied Materials Inc.
0 cites
US116704862023
Pulsed Plasma Chamber in Dual Chamber Configuration
Lam Research Corporation
0 cites
US116669522023
Condition Selectable Backside Gas
Applied Materials, Inc.
0 cites
US115944002023
Multi Zone Gas Injection Upper Electrode System
Lam Research Corporation
0 cites
US115519162023
Sheath and Temperature Control of a Process Kit in a Substrate Processing Chamber
APPLIED MATERIALS, Inc.
0 cites