4 Patents
- US122243262025Contact Architecture for Capacitance Reduction and Satisfactory Contact Resistance
Intel Corporation
0 cites - US119089402024Field Effect Transistor with a Hybrid Gate Spacer Including a Low-k Dielectric Material
Intel Corporation
0 cites - US118240972023Contact Architecture for Capacitance Reduction and Satisfactory Contact Resistance
Intel Corporation
0 cites - 0 cites