24 Patents
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- US124865772025Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials, Inc.
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- US123259102025Deposition of Conformal and Gap-fill Amorphous Silicon Thin-films
Applied Materials, Inc.
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- US117840422023Carbon Hard Masks for Patterning Applications and Methods Related Thereto
APPLIED MATERIALS, Inc.
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- US116642142023Methods for Producing High-density, Nitrogen-doped Carbon Films for Hardmasks and Other Patterning Applications
APPLIED MATERIALS, Inc.
0 cites - US116642262023Methods for Producing High-density Carbon Films for Hardmasks and Other Patterning Applications
APPLIED MATERIALS, Inc.
0 cites - 0 cites
- US116035912023Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials Inc.
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- US115574662023Tuneable Uniformity Control Utilizing Rotational Magnetic Housing
Applied Materials, Inc.
0 cites - 0 cites